(Printed circuit board)

 

What Is It?

The Focused Ion Beam (FIB) technique is analogous to Scanning Electron Microscopy (SEM) in that it scans a focused probe beam, in this case ions rather than electrons, across the surface of interest.
 

Why Should I Use It?

This beam can be used to generate high-resolution images of the sample or to mill into the sample to expose the internal structure.
 

What Do I Get Out of It?

This combination of high-resolution imaging to locate features of interest followed by precise site-specific milling provides an invaluable tool for sample preparation and analysis, providing rapid cross-sectional analysis of features that would be difficult or impossible to otherwise prepare. Because of this, the FIB instrument is often used as a sample preparation tool for more complete characterization using Electron Microscopy.
 

Applications Include:

  • Materials Evaluation
  • Process Development
  • Protective coatings
  • Inclusions
  • Grain size distributions
  • Layered structures
  • X-sections of hard to polish materials
  • Micromachining
  • Failure Analysis
  • Precise site-specific cross-sections
  • Sub-surface contamination/defects
  • Delamination
  • ESD damage
  • Quality Control
  • Layer thicknesses
  • Etch profiles
  • Step coverage and conformality

 

Download the Full Capabilities Sheet